TSMC and Samsung, major global chip manufacturers, have committed to integrating ASML's High NA extreme ultraviolet (EUV) lithography machines into their production processes. These machines are crucial for printing circuit patterns onto silicon wafers and can create smaller, more intricate designs. Each High NA machine costs approximately $400 million.
Samsung, a leading memory chipmaker, announced its intention to utilize ASML's High NA EUV machines for producing DRAM, a key type of memory, starting in 2028. The company stated that adopting this technology by 2030 will extend the DRAM scaling roadmap and enhance manufacturing efficiency.
TSMC will deploy ASML's tools for advanced chip manufacturing. The company anticipates an increase in the use of High NA machines, primarily due to the complex transistor architectures required for artificial intelligence (AI) applications. This aligns with the growing industry demand for more powerful chips to support AI development.
Both TSMC and Samsung will also participate with ASML in an industry initiative aimed at advancing next-generation 12-inch photomask technology. This represents an upgrade from the current 6-inch format. Photomasks serve as stencils for printing patterns on wafers, and a larger format is expected to improve productivity and reduce chipmaking costs.
Intel is already a customer for ASML's High NA machines, using the technology for advanced chip manufacturing. While ASML has not provided recent sales forecasts for these machines, it plans to increase its total EUV capacity by about 30% by 2027. Analysts view these commitments from TSMC and Samsung as providing greater clarity on adoption, which is seen as positive for ASML's future growth.
✨ This summary was generated by AI from the outlets' reporting listed below. It is not independently verified and may contain errors — check the original sources. How BrevFeed works →
One email each morning: the day's tech stories, clustered across outlets and summarized. No account needed.
One email a day. Unsubscribe in one click, any time.
Spend a few minutes, get the whole day. Every topic's top stories in one hands-free rundown — listen, watch, or read the transcript.
▶ Play today's briefNew every morning, and the back catalogue is archived by date.
Chinese chip manufacturers are producing advanced processors, such as Huawei's Kirin 9000S and 9030, using deep ultraviolet (DUV) lithography despite export controls on extreme ultraviolet (EUV) machines. This is achieved through multiple patterning techniques, which increase manufacturing complexity, cost, and defect rates compared to EUV. The approach allows China to narrow the technology gap but at a growing expense.
An X user, @lithos_graphein, created and shared building instructions for an 810-piece Lego replica of ASML's TWINSCAN EXE:5000 High-NA EUV machine, which was originally released as an employee-exclusive kit. This fan-made version includes enhanced details and interior components not present in the original, making the design publicly accessible for enthusiasts.
ASML reported record quarterly revenue of $13.06 billion in Q3 2026, driven by high demand for advanced semiconductor manufacturing equipment. The company anticipates demand for its lithography systems will exceed production capacity by 2027-2028, prompting consideration of further capacity expansions.
ASML reports unprecedented demand for its chipmaking tools, with orders extending to 2029 and 2030, driven by the AI boom. The company plans to increase capacity by 60% by 2028 but still anticipates struggling to meet demand, leading to price increases starting in 2027. This indicates sustained growth in the AI industry and continued investment in chip production.
Elon Musk's Terafab is slated to receive its first ASML EUV lithography tool in mid-2027, according to reports. This delivery precedes the completion of the fab's development shell, which is expected in late 2027, indicating the tool will sit idle for several months. The use of a conventional EUV tool suggests Terafab's initial chip production will rely on established technology, specifically Intel's 14A process, rather than experimental free electron laser sources.
ASML reported third-quarter profit that exceeded expectations and noted customer interest in placing orders for its semiconductor tools through 2029 and 2030. This indicates strong long-term demand for ASML's lithography machines, driven by AI-related investments, and has led the company to raise its 2026 sales forecast.
Taiwan Semiconductor Manufacturing Co (TSMC) reported September revenue of $16.03 billion, a 54.6% increase year-over-year, attributed to strong demand for advanced AI chips. This growth reflects the ongoing impact of AI on the semiconductor manufacturing sector.
Chinese chipmakers have acquired an estimated 343 immersion DUV lithography tools between 2012 and early 2026, with many capable of 7nm-class chip production. This accumulation provides China with significant potential for sophisticated processor manufacturing despite restrictions on advanced EUV systems. The report suggests a gap in export controls, as DUV equipment for less advanced processes can be repurposed for more advanced nodes.
ASML, the sole supplier of EUV lithography systems, reported that 0% of its revenue in 2026 came from Europe, a decrease from 1% in 2025 and 5% in 2024. The company is urging EU authorities to stimulate demand for European-made chips to encourage local semiconductor manufacturing investments.
ASML will not adopt free-electron laser (FEL) technology for its extreme ultraviolet (EUV) lithography scanners, opting instead to continue developing its existing laser-produced plasma (LPP) systems. This decision means ASML will focus on increasing the power of its current LPP light sources to 1000W, impacting the future direction of EUV chip manufacturing technology.
TSMC, Samsung, and Intel are working with ASML to transition to 6x12-inch photomasks for High-NA EUV lithography. This change is necessary to enable single-pass printing of large chips, which High-NA EUV's anamorphic optics currently prevent, requiring a stitching process that reduces throughput and complicates design.
Samsung Electronics and TSMC will adopt ASML's high NA EUV photolithography machines and have agreed to a technology change that could increase chip production by 40%. This adoption signifies a broader industry embrace of advanced EUV technology for manufacturing next-generation chips.
TSMC announced plans to begin using High-NA EUV lithography for high-volume manufacturing in 2030, transitioning from current Low-NA EUV systems. This adoption is driven by the increasing complexity of transistor architectures, such as GAA transistors and CFETs, which require more advanced patterning capabilities.
Samsung and TSMC will adopt ASML's High NA extreme ultraviolet (EUV) lithography machines and larger 12-inch photomasks, following Intel's earlier deployment. This move aims to increase production capacity, boost manufacturing yields, and lower chipmaking costs for high-end chips and RAM, potentially addressing current chip shortages.
TSMC and Samsung, the world's largest chipmakers, have committed to using ASML's High NA extreme ultraviolet (EUV) lithography machines for advanced chip production, driven by increasing demand for AI applications. This adoption signifies a move towards more intricate chip designs and improved manufacturing efficiency, with Samsung planning to use the technology for DRAM production from 2028.